SIST-TS CEN ISO/TS 80004-13:2024

SLOVENSKI STANDARD
01-december-2024
Nanotehnologije - Slovar - 13. del: Grafen in drugi dvodimenzionalni (2D) materiali
(ISO/TS 80004-13:2024)
Nanotechnologies - Vocabulary - Part 13: Graphene and other two-dimensional (2D)
materials (ISO/TS 80004-13:2024)
Nanotechnologien - Fachwörterverzeichnis - Teil 13: Graphen und andere
zweidimensionale (2D) Werkstoffe (ISO/TS 80004-13:2024)
Nanotechnologies - Vocabulaire - Partie 13: Graphène et autres matériaux
bidimensionnels (2D) (ISO/TS 80004-13:2024)
Ta slovenski standard je istoveten z: CEN ISO/TS 80004-13:2024
ICS:
01.040.07 Naravoslovne in uporabne Natural and applied sciences
vede (Slovarji) (Vocabularies)
07.120 Nanotehnologije Nanotechnologies
2003-01.Slovenski inštitut za standardizacijo. Razmnoževanje celote ali delov tega standarda ni dovoljeno.

CEN ISO/TS 80004-13
TECHNICAL SPECIFICATION
SPÉCIFICATION TECHNIQUE
September 2024
TECHNISCHE SPEZIFIKATION
ICS 07.120 Supersedes CEN ISO/TS 80004-13:2020
English Version
Nanotechnologies - Vocabulary - Part 13: Graphene and
other two-dimensional (2D) materials (ISO/DTS 80004-
13:2024)
Nanotechnologies - Vocabulaire - Partie 13: Graphène Nanotechnologien - Fachwörterverzeichnis - Teil 13:
et autres matériaux bidimensionnels (2D) (ISO/DTS Graphen und andere zweidimensionale (2D)
80004-13:2024) Werkstoffe (ISO/DTS 80004-13:2024)
This Technical Specification (CEN/TS) was approved by CEN on 23 August 2024 for provisional application.

The period of validity of this CEN/TS is limited initially to three years. After two years the members of CEN will be requested to
submit their comments, particularly on the question whether the CEN/TS can be converted into a European Standard.

CEN members are required to announce the existence of this CEN/TS in the same way as for an EN and to make the CEN/TS
available promptly at national level in an appropriate form. It is permissible to keep conflicting national standards in force (in
parallel to the CEN/TS) until the final decision about the possible conversion of the CEN/TS into an EN is reached.

CEN members are the national standards bodies of Austria, Belgium, Bulgaria, Croatia, Cyprus, Czech Republic, Denmark, Estonia,
Finland, France, Germany, Greece, Hungary, Iceland, Ireland, Italy, Latvia, Lithuania, Luxembourg, Malta, Netherlands, Norway,
Poland, Portugal, Republic of North Macedonia, Romania, Serbia, Slovakia, Slovenia, Spain, Sweden, Switzerland, Türkiye and
United Kingdom.
EUROPEAN COMMITTEE FOR STANDARDIZATION
COMITÉ EUROPÉEN DE NORMALISATION

EUROPÄISCHES KOMITEE FÜR NORMUNG

CEN-CENELEC Management Centre: Rue de la Science 23, B-1040 Brussels
© 2024 CEN All rights of exploitation in any form and by any means reserved Ref. No. CEN ISO/TS 80004-13:2024 E
worldwide for CEN national Members.

Contents Page
European foreword . 3

European foreword
This document (CEN ISO/TS 80004-13:2024) has been prepared by Technical Committee ISO/TC 229
"Nanotechnologies" in collaboration with Technical Committee CEN/TC 352 “Nanotechnologies” the
secretariat of which is held by AFNOR.
Attention is drawn to the possibility that some of the elements of this document may be the subject of
patent rights. CEN shall not be held responsible for identifying any or all such patent rights.
This document supersedes CEN ISO/TS 80004-13:2020.
Any feedback and questions on this document should be directed to the users’ national standards
body/national committee. A complete listing of these bodies can be found on the CEN website.
According to the CEN-CENELEC Internal Regulations, the national standards organizations of the
following countries are bound to announce this Technical Specification: Austria, Belgium, Bulgaria,
Croatia, Cyprus, Czech Republic, Denmark, Estonia, Finland, France, Germany, Greece, Hungary, Iceland,
Ireland, Italy, Latvia, Lithuania, Luxembourg, Malta, Netherlands, Norway, Poland, Portugal, Republic of
North Macedonia, Romania, Serbia, Slovakia, Slovenia, Spain, Sweden, Switzerland, Türkiye and the
United Kingdom.
Endorsement notice
The text of ISO/TS 80004-13:2024 has been approved by CEN as CEN ISO/TS 80004-13:2024 without
any modification.
Technical
Specification
ISO/TS 80004-13
Second edition
Nanotechnologies — Vocabulary —
2024-09
Part 13:
Graphene and other two-
dimensional (2D) materials
Nanotechnologies — Vocabulaire —
Partie 13: Graphène et autres matériaux bidimensionnels (2D)
Reference number
ISO/TS 80004-13:2024(en) © ISO 2024

ISO/TS 80004-13:2024(en)
© ISO 2024
All rights reserved. Unless otherwise specified, or required in the context of its implementation, no part of this publication may
be reproduced or utilized otherwise in any form or by any means, electronic or mechanical, including photocopying, or posting on
the internet or an intranet, without prior written permission. Permission can be requested from either ISO at the address below
or ISO’s member body in the country of the requester.
ISO copyright office
CP 401 • Ch. de Blandonnet 8
CH-1214 Vernier, Geneva
Phone: +41 22 749 01 11
Email: copyright@iso.org
Website: www.iso.org
Published in Switzerland
ii
ISO/TS 80004-13:2024(en)
Contents Page
Foreword .iv
Introduction .v
1 Scope . 1
2 Normative references . 1
3 Terms and definitions . 1
3.1 Terms related to materials .1
3.1.1 General terms related to graphene and other 2D materials.1
3.1.2 Terms related to graphene related 2D materials .5
3.1.3 Terms related to other 2D materials .8
3.2 Terms related to methods for producing 2D materials .9
3.2.1 Graphene and related 2D material production .9
3.2.2 Nanoribbon production . 12
3.3 Terms related to methods for characterizing 2D materials . 13
3.3.1 Structural characterization methods . 13
3.3.2 Chemical characterization methods . 15
3.3.3 Electrical characterization methods .16
3.4 Terms related to 2D materials characteristics .17
3.4.1 Characteristics and terms related to structural and dimensional properties of
2D materials .17
3.4.2 Characteristics and terms related to chemical properties of 2D materials . 20
3.4.3 Characteristics and terms related to optical and electrical properties of 2D
materials .21
4 Abbreviated terms .21
Bibliography .23
Index .24

iii
ISO/TS 80004-13:2024(en)
Foreword
ISO (the International Organization for Standardization) and IEC (the International Electrotechnical
Commission) form the specialized system for worldwide standardization. National bodies that are
members of ISO or IEC participate in the development of International Standards through technical
committees established by the respective organization to deal with particular fields of technical activity.
ISO and IEC technical committees collaborate in fields of mutual interest. Other international organizations,
governmental and non-governmental, in liaison with ISO and IEC, also take part in the work.
The procedures used to develop this document and those intended for its further maintenance are described
in the ISO/IEC Directives, Part 1. In particular, the different approval criteria needed for the different types
of document should be noted. This document was drafted in accordance with the editorial rules of the ISO/
IEC Directives, Part 2 (see www.iso.org/directives or www.iec.ch/members_experts/refdocs).
ISO and IEC draw attention to the possibility that the implementation of this document may involve the
use of (a) patent(s). ISO and IEC take no position concerning the evidence, validity or applicability of any
claimed patent rights in respect thereof. As of the date of publication of this document, ISO and IEC had not
received notice of (a) patent(s) which may be required to implement this document. However, implementers
are cautioned that this may not represent the latest information, which may be obtained from the patent
database available at www.iso.org/patents and https://patents.iec.ch. ISO and IEC shall not be held
responsible for identifying any or all such patent rights.
Any trade name used in this document is information given for the convenience of users and does not
constitute an endorsement.
For an explanation of the voluntary nature of standards, the meaning of ISO specific terms and expressions
related to conformity assessment, as well as information about ISO's adherence to the World Trade
Organization (WTO) principles in the Technical Barriers to Trade (TBT) see www.iso.org/iso/foreword.html.
In the IEC, see www.iec.ch/understanding-standards.
This document was prepared jointly by Technical Committee ISO/TC 229, Nanotechnologies, and Technical
Committee IEC/TC 113, Nanotechnology for electrotechnical products and systems, and in collaboration with
the European Committee for Standardization (CEN) Technical Committee CEN/TC 352, Nanotechnologies, in
accordance with the Agreement on technical cooperation between ISO and CEN (Vienna Agreement). The
draft was circulated for voting to the national bodies of both ISO and IEC.
This second edition cancels and replaces the first edition (ISO/TS 80004-13:2017) which has been technically
revised.
The main changes are as follows:
— addition of the term "graphene-related 2D material (GR2M)";
— expansion of defined terms to include "enhanced", "modified", "enabled" and "based", and derivatives
thereof;
— indication that use of some terms are deprecated.
A list of all parts in the ISO 80004 series can be found on the ISO website.
Any feedback or questions on this document should be directed to the user’s national standards body. A
complete listing of these bodies can be found at www.iso.org/members.html.

iv
ISO/TS 80004-13:2024(en)
Introduction
Over the last decade, huge interest has arisen in graphene, both scientifically and commercially, due to the
many exceptional properties associated with this material, such as the electrical and thermal conductivity.
More recently, other materials with a structure similar to that of graphene have also shown promising
properties, including:
a) monolayer and few-layer versions of hexagonal boron nitride (hBN);
b) transition metal dichalcogenides such as molybdenum disulphide (MoS ) and tungsten diselenide (WSe );
2 2
c) silicene and germanene;
d) layered assemblies of mixtures of these materials.
These materials have their thickness constrained within the nanoscale or smaller and consist of between
one and several layers. These materials are thus termed two-dimensional (2D) materials as they have one
dimension at the nanoscale or smaller, with the other two dimensions generally at scales larger than the
nanoscale. A layered material consists of 2D layers weakly stacked or bound to form three-dimensional
structures. Examples of 2D materials and the different stacking configurations in graphene are shown in
Figure 1. 2D materials are not necessarily topographically flat in reality and can have a buckled structure.
They can also form aggregates and agglomerates which can have different morphologies. 2D materials are
an important subset of nanomaterials.
graphene hBN graphane perfluoro- MoS WSe
2 2
graphane
a) Examples of different 2D materials consisting of different elements and structures, as shown by
the different coloured orbs and top-down and side views

v
ISO/TS 80004-13:2024(en)
b) Bernal stacked bilayer graphene (3.1.2.7) c) Turbostratic bilayer or twisted bilayer
graphene with relative stacking angle (θ)(3.1.2.8)
ABA trilayer ABC trilayer
d) Bernal stacked (AB) (3.4.1.12) tri-layer graphene (3.1.2.10) and rhombohedral (ABC) (3.4.1.13)
stacked tri-layer graphene (3.1.2.10)
Figure 1 — Examples of 2D materials and the different stacking configurations in graphene layers
It is important to standardize the terminology for graphene, graphene-related and other 2D materials at the
international level, as the number of publications, patents and organizations is increasing rapidly. Thus, these
materials need an associated vocabulary as they become commercialized and sold throughout the world.
The document contains general terms related to 2D materials, those related to graphene, and those related
to other 2D materials. It provides terms related to commonly used methods for producing and characterising
2D materials along, with terms related to 2D materials characteristics. It also includes performance
related terms, such as “-enhanced” and “-enabled”, and those related to composition, such as “-based” and
“-modified”, as shown in Figure 2.
Figure 2 — General terms to describe 2D materials split into performance and composition
related terms
This document belongs to a multi-part vocabulary, covering the different aspects of nanotechnologies. It
builds upon ISO 80004-1, ISO/TS 80004-3 and ISO/TS 80004-6, and uses existing definitions where possible.

vi
Technical Specification ISO/TS 80004-13:2024(en)
Nanotechnologies — Vocabulary —
Part 13:
Graphene and other two-dimensional (2D) materials
1 Scope
This document defines terms for graphene, graphene-related two-dimensional (2D) materials and other 2D
materials. It includes related terms for production methods, properties and characterization.
It is intended to facilitate communication between organizations and individuals in research, industry and
other interested parties and those who interact with them.
2 Normative references
There are no normative references in this document.
3 Terms and definitions
ISO and IEC maintain terminology databases for use in standardization at the following addresses:
— ISO Online browsing platform: available at http:// www .iso .org/ obp
— IEC Electropedia: available at http:// www .electropedia .org/
3.1 Terms related to materials
3.1.1 General terms related to graphene and other 2D materials
3.1.1.1
two-dimensional material
2D material
material, consisting of one or several layers (3.1.1.8) with the atoms in each layer strongly bonded to
neighbouring atoms in the same layer, which has one dimension, its thickness, in the nanoscale or smaller
and the other two dimensions generally at larger scales
Note 1 to entry: The number of layers when a two-dimensional material becomes a bulk material varies depending on
both the material being measured and its properties. In the case of graphene layers (3.1.2.1), it is a two-dimensional
[10]
material of up to 10 layers thick for electrical measurements, beyond which the electrical properties of the material
are not distinct from those for the bulk [also known as graphite (3.1.2.2)].
Note 2 to entry: Interlayer bonding is distinct from and weaker than intralayer bonding.
Note 3 to entry: Each layer can contain more than one element.
Note 4 to entry: A two-dimensional material can be a nanoplate (3.1.1.5).

ISO/TS 80004-13:2024(en)
3.1.1.2
graphene-related 2D material
GR2M
DEPRECATED: graphene-based material, graphene-material
carbon-based two-dimensional material (3.1.1.1) consisting of one to 10 layers (3.1.1.8), including graphene
(3.1.2.1), graphene oxide (3.1.2.15), reduced graphene oxide (3.1.2.16), and functionalized variations thereof
Note 1 to entry: This includes bilayer graphene (3.1.2.7), trilayer graphene (3.1.2.10) and few-layer graphene (3.1.2.11).
Note 2 to entry: The terms graphene-based material and graphene-material are deprecated here. They have been used
to describe materials other than graphene, such as graphene oxide.
Note 3 to entry: "Graphene-related 2D material" is defined in contrast with graphene-based (3.1.1.20) and GR2M-based
(3.1.1.21).
3.1.1.3
flake
<2D material> distinct particle of planar morphology, consisting of 1 or more layers (3.1.1.8) of material,
with a nanoscale thickness that is significantly smaller than its lateral dimensions
3.1.1.4
sheet
<2D material> 2D material (3.1.1.1) typically situated upon a substrate, with extended lateral dimensions at
the micro to macroscale
3.1.1.5
nanoplate
nano-object with one external dimension in the nanoscale and the other two external dimensions
significantly larger
Note 1 to entry: The larger external dimensions are not necessarily in the nanoscale.
[SOURCE: ISO 80004-1:2023, 3.3.6]
3.1.1.6
nanofoil
nanosheet
nanoplate (3.1.1.5) with extended lateral dimensions
Note 1 to entry: Nanofoil and nanosheet are used synonymously in specific industrial areas.
Note 2 to entry: Nanofoil and nanosheet extend further with respect to their length and width compared to nanoplate
or nanoflake.
[SOURCE: ISO 80004-1:2023, 3.3.6.2]
3.1.1.7
nanoribbon
nanotape
nanoplate (3.1.1.5) with the two larger dimensions significantly different from each other
[SOURCE: ISO 80004-1:2023, 3.3.10]
3.1.1.8
layer
discrete material restricted in one dimension, within or at the surface of a condensed phase
[SOURCE: ISO 80004-1:2023, 3.6.2]

ISO/TS 80004-13:2024(en)
3.1.1.9
quantum dot
nanoparticle or region which exhibits quantum confinement in all three spatial directions
[SOURCE: ISO/TS 80004-12:2016, 4.1]
3.1.1.10
enhanced
<2D material> exhibiting function or performance intensified or improved through the use of a 2D material
(3.1.1.1)
EXAMPLE Graphene oxide-enhanced film.
Note 1 to entry: In enhanced products, the 2D material is typically used in low concentration in the product.
Note 2 to entry: Typical usage is: "X-enhanced Y", where X is the 2D material and Y is the product.
Note 3 to entry: Compare to based (3.1.1.19).
3.1.1.11
graphene-enhanced
exhibiting function or performance intensified or improved through the use of graphene (3.1.2.1)
EXAMPLE Graphene-enhanced solar cells.
Note 1 to entry: In graphene-enhanced products, the graphene is typically used in low concentration in the product.
Note 2 to entry: In common usage, this term is often incorrectly used to apply to GR2M (3.1.1.2) and not just to single-
layer graphene (3.1.2.1). The correct term is GR2M-enhanced (3.1.1.12) or, for example, when referring to graphene
nanoplatelets: GNP-enhanced.
Note 3 to entry: Compare to graphene-based (3.1.1.20).
3.1.1.12
GR2M-enhanced
DEPRECATED: graphene-enhanced
exhibiting function or performance intensified or improved through the use of GR2M (3.1.1.2)
EXAMPLE GR2M-enhanced solar cells.
Note 1 to entry: In GR2M-enhanced products, the GR2M is typically used in low concentration in the product.
Note 2 to entry: Compare to GR2M-based (3.1.1.21).
Note 3 to entry: Graphene-enhanced is deprecated since the use of this term only applies to the use of (single-layer)
graphene (3.1.2.1) as defined by 3.1.1.11.
3.1.1.13
modified
<2D material> intentional addition of the indicated 2D material (3.1.1.1)
Note 1 to entry: Typical usage is: "X-modified", where X is either a specific 2D material or a class of 2D materials.
Note 2 to entry: The use of this term does not imply property or performance enhancement through the use of the 2D
material.
3.1.1.14
graphene-modified
intentional addition of graphene (3.1.2.1) to a material
Note 1 to entry: In common usage, this term is often incorrectly used to apply to GR2M (3.1.1.2) and not just to single-
layer graphene (3.1.2.1). The correct term is GR2M-modified (3.1.1.15) or, for example, when referring to graphene
nanoplatelets: GNP-modified.
ISO/TS 80004-13:2024(en)
Note 2 to entry: The use of this term does not imply property or performance enhancement through the use of
graphene.
3.1.1.15
GR2M-modified
DEPRECATED: graphene-modified
intentional addition of GR2M (3.1.1.2) to a material
Note 1 to entry: Graphene-modified is deprecated since the use of this term only applies to the use of single-layer
graphene (3.1.2.1) as defined by 3.1.1.14.
Note 2 to entry: The use of this term does not imply property or performance enhancement through the use of the GR2M.
3.1.1.16
enabled
<2D material> exhibiting function or performance possible through the use of a 2D material (3.1.1.1)
Note 1 to entry: Typical usage is: "X-enabled", where X is either a specific 2D material or a class of 2D materials.
3.1.1.17
graphene-enabled
exhibiting function or performance possible through the use of graphene (3.1.2.1)
Note 1 to entry: This term in common usage is often incorrectly used to apply to GR2M (3.1.1.2) and not just to single-
layer graphene (3.1.2.1). The correct term is GR2M-enabled (3.1.1.18) or, for example, when referring to graphene
nanoplatelets: GNP-enabled.
3.1.1.18
GR2M-enabled
DEPRECATED: graphene-enabled
exhibiting function or performance possible through the use of GR2M (3.1.1.2)
Note 1 to entry: Graphene-enabled is deprecated since the use of graphene-enabled only applies to the use of single-
layer graphene (3.1.2.1) as defined by 3.1.1.17.
3.1.1.19
based
<2D material> predominately consisting of, or as the key component
EXAMPLE GR2M-based, few-layer graphene-based.
Note 1 to entry: Typical usage is: "X-based Y", where X is either a specific 2D material (3.1.1.1) or a class of 2D materials
and Y is the product.
Note 2 to entry: When using in terms of a product, here the majority of the functional part of the product is composed
of the specified 2D material.
3.1.1.20
graphene-based
predominantly consisting of graphene (3.1.2.1), or with graphene as a key component
EXAMPLE Graphene-based sensor, graphene-based ink.
Note 1 to entry: Typically, the majority of the functional part of the product is composed of graphene.
Note 2 to entry: While graphene-based is a commonly used expression, in many situations it is more correct to use a
different term such as graphene-enhanced (3.1.1.11), graphene-modified (3.1.1.14) or graphene-enabled (3.1.1.17).
Note 3 to entry: In common usage, this term is often incorrectly used to apply to GR2M (3.1.1.2) and not just to
single-layer graphene (3.1.2.1). The correct term is GR2M-based (3.1.1.21) or, for example, when referring to graphene
nanoplatelets: GNP-based.
ISO/TS 80004-13:2024(en)
3.1.1.21
GR2M-based
DEPRECATED: graphene-based
predominantly consisting of GR2M (3.1.1.2), or with GR2M as a key component
Note 1 to entry: Typically, here the majority of the functional part of the product is composed of GR2M.
Note 2 to entry: In many situations, it is more correct to use a different term such as GR2M-enhanced (3.1.1.12), GR2M-
modified (3.1.1.15) or GR2M-enabled (3.1.1.18).
Note 3 to entry: Graphene-based is deprecated since the use of graphene-based only applies to the use of single-layer
graphene (3.1.2.1) as defined by 3.1.1.20.
3.1.2 Terms related to graphene related 2D materials
3.1.2.1
graphene
graphene layer
single-layer graphene
monolayer graphene
1LG
single layer (3.1.1.8) of carbon atoms with each atom bound to three neighbours in a honeycomb structure
Note 1 to entry: It is an important building block of many carbon nano-objects.
Note 2 to entry: As graphene is a single layer, it is also sometimes called monolayer graphene or single-layer graphene
and abbreviated as 1LG to distinguish it from bilayer graphene (2LG) (3.1.2.7) and few-layered graphene (FLG) (3.1.2.11).
Note 3 to entry: Graphene has edges and can have defects and grain boundaries where the bonding is disrupted.
Note 4 to entry: In situations where the word graphene is used as an adjective, including in terms such as graphene-
enabled, the term commonly and incorrectly refers to GR2M (3.1.1.2) and not just to single-layer graphene.
3.1.2.2
graphite
allotropic form of the element carbon, consisting of graphene layers (3.1.2.1) stacked parallel to each other in
a three-dimensional, crystalline, long-range order
Note 1 to entry: Adapted from the definition in the IUPAC Compendium of Chemical Terminology.
Note 2 to entry: There are two primary allotropic forms with different stacking arrangements: hexagonal and
rhombohedral.
3.1.2.3
nanographite
flake (3.1.1.3) that consists of layers (3.1.1.8) of graphene with a thickness of 11 or more layers, with a total
thickness of up to 100 nm
3.1.2.4
graphane
single layer (3.1.1.8) material consisting of a two-dimensional sheet (3.1.1.4) of carbon and hydrogen with
the repeating unit of (CH)
n
Note 1 to entry: Graphane is the full hydrogenated form of graphene with carbon atoms in the sp bonding
configuration.
3.1.2.5
perfluorographane
single layer (3.1.1.8) material consisting of a two-dimensional sheet (3.1.1.4) of carbon and fluorine with
each carbon atom bonded to one fluorine atom with the repeating unit of (CF)
n
Note 1 to entry: Perfluorographane has carbon atoms in the sp bonding configuration.

ISO/TS 80004-13:2024(en)
Note 2 to entry: Perfluorographane is sometimes referred to as fluorographene.
3.1.2.6
epitaxial graphene
graphene layer (3.1.2.1) grown on a silicon carbide substrate
Note 1 to entry: Graphene can be grown by epitaxy on other substrates, for example, Ni(111), but these materials are
not termed epitaxial graphene.
Note 2 to entry: This specific definition applies only in the field of graphene. In general, the term “epitaxial” refers to
the epitaxial growth of a film on a single crystal substrate.
3.1.2.7
bilayer graphene
2LG
two-dimensional material (3.1.1.1) consisting of two well-defined stacked graphene layers (3.1.2.1)
Note 1 to entry: If the stacking registry is known, it can be specified separately, for example, as “Bernal stacked bilayer
graphene”.
3.1.2.8
twisted bilayer graphene
turbostratic bilayer graphene
tBLG
t2LG
two-dimensional material (3.1.1.1) consisting of two well-defined graphene layers (3.1.2.1) that are
turbostratically stacked, with a relative stacking angle (3.4.1.14), also known as commensurate rotation,
rather than Bernal (hexagonal) (3.4.1.12) or rhombohedral stacking (3.4.1.13)
3.1.2.9
twisted few-layer graphene
t(n+m)LG
two-dimensional material (3.1.1.1) consisting of a few-layers of graphene of n Bernal stacked layers (3.1.1.8)
which are situated with a relative stacking angle (3.4.1.14) upon m Bernal stacked layers
3.1.2.10
trilayer graphene
3LG
two-dimensional material (3.1.1.1) consisting of three well-defined stacked graphene layers (3.1.2.1)
Note 1 to entry: If the stacking registry is known, it can be specified separately, for example, as “twisted trilayer
graphene”.
3.1.2.11
few-layer graphene
FLG
two-dimensional material (3.1.1.1) consisting of three to ten well-defined stacked graphene layers (3.1.2.1)
3.1.2.12
graphene nanoplatelet
GNP
nanoplate (3.1.1.5) consisting of graphene layers (3.1.2.1)
Note 1 to entry: GNPs typically have a thickness of between 1 nm to 3 nm and lateral dimensions ranging from
approximately 100 nm to 100 µm.

ISO/TS 80004-13:2024(en)
3.1.2.13
turbostratic few-layer graphene particle
tFLG particle
minute, non-planar piece of matter with defined physical boundaries consisting of multiple single-layer,
bilayer or few-layer graphene stacks at different orientations to each other which can have random and
varying stacking angles
Note 1 to entry: These are primary particles and are typically produced through bottom-up production. They contain
strong covalent bonds as well as weaker Van der Waals forces.
Note 2 to entry: These can be analysed using TEM. An example is shown in Reference [11].
Note 3 to entry: An example sketch of a tFLG particle is given in Figure 3.
Figure 3 — Example sketch of turbostratic few-layer graphene particle
3.1.2.14
graphite oxide
chemically modified graphite (3.1.2.2) prepared by extensive oxidative modification of the basal planes
Note 1 to entry: The structure and properties of graphite oxide depend on the degree of oxidation and the particular
synthesis method.
Note 2 to entry: In powder form, restacking of graphite oxide layers (3.1.1.8) can occur.
3.1.2.15
graphene oxide
GO
chemically modified graphene (3.1.2.1), with extensive oxidative modification of the basal plane
Note 1 to entry: Graphene oxide is a single-layer material with a high oxygen content (3.4.2.7), typically characterized
by O/C atomic ratios of approximately 0,5 (C/O ratios of approximately 2,0) depending on the method of synthesis.
Note 2 to entry: Graphene oxide is predominately prepared by oxidation and exfoliation of graphite.
Note 3 to entry: Oxidative modification can also occur at the edges.
Note 4 to entry: Restacking of graphene oxide can occur. Therefore, care must be taken when preparing samples or
products from highly concentrated liquid dispersions as this can lead to agglomeration and aggregation of the primary
particles, which are a single-layer.
3.1.2.16
reduced graphene oxide
rGO
reduced oxygen content (3.4.2.7) form of graphene oxide (3.1.2.15)
Note 1 to entry: This can be produced by chemical, thermal, microwave, photo-chemical, photo-thermal or microbial
or bacterial methods, or by exfoliating reduced graphite oxide.
Note 2 to entry: If graphene oxide was fully reduced, then graphene would be the product. However, in practice, some
3 2
oxygen containing functional groups will remain and not all sp bonds will return back to sp configuration. Different
reducing agents will lead to different carbon to oxygen ratios and different chemical compositions in reduced
graphene oxide.
Note 3 to entry: It can take the form of several morphological variations such as platelets and worm-like structures.

ISO/TS 80004-13:2024(en)
Note 4 to entry: The O/C atomic ratio is approximately 0,1 to 0,5 (C/O ratio 2 to 10).
3.1.2.17
functionalization
process that intentionally alters the surface chemical properties through a distinct chemical process
Note 1 to entry: Functionalized material should be referred to as "functionalized X", where X refers to the material
such as graphene, graphene nanoplatelet, etc.
3.1.2.18
functionalized graphene nanoplatelets
functionalized GNPs
graphene nanoplatelets (3.1.2.12) that have had their surface chemical properties intentionally altered
through a distinct chemical process
3.1.3 Terms related to other 2D materials
3.1.3.1
MXene
two-dimensional metal carbides and nitrides, with a structure consisting of two or more atomic planes of
transition metal (M) atoms packed into a honeycomb-like 2D lattice, that are intervened by either carbon
or nitrogen layers (X atoms), or both, occupying the octahedral sites between the adjacent transition metal
atomic planes
Note 1 to entry: Oxygen can also be present in the X sites in some MXenes as oxycarbides or oxynitrides.
3.1.3.2
transition metal dichalcogenide
TMDC
TMD
semiconducting two-dimensional material (3.1.1.1) consisting of three atomic planes: a central one with
transition metal atoms between two planes of chalcogen atoms, in a honeycomb, hexagonal lattice with
threefold symmetry
Note 1 to entry: Examples of TMDs include MoS2, WS , MoSe , Wse , MoTe
2 2 2 2.
3.1.3.3
silicene
two-dimensional material (3.1.1.1) consisting of a single layer (3.1.1.8) of silicon atoms with each atom bound
to three neighbours in a honeycomb structure
Note 1 to entry: A 2D layer of silicene is not completely flat, but instead has a corrugated morphology.
3.1.3.4
germanene
two-dimensional material (3.1.1.1) consisting of a single layer (3.1.1.8) of germanium atoms with each atom
bound to three neighbours in a honeycomb structure
Note 1 to entry: A 2D layer of germanene is not completely flat, but instead has a corrugated morphology.
3.1.3.5
stanene
two-dimensional material (3.1.1.1) consisting of a single layer (3.1.1.8) of tin atoms with each atom bound to
three neighbours in a honeycomb structure
Note 1 to entry: A 2D layer of stanene is not completely flat, but instead has a corrugated morphology.
3.1.3.6
phosphorene
two-dimensional material (3.1.1.1) consisting of a single layer (3.1.1.8) of black phosphorus, consisting
of phosphorus atoms each bound to three neighbours in a quadrangular pyramid structure via sp
hybridisation
ISO/TS 80004-13:2024(en)
3.1.3.7
2D heterostructure
two-dimensional material (3.1.1.1) consisting of two or more well-defined layers (3.1.1.8) of different 2D
materials
Note 1 to entry: These can be stacked together in-plane or out-of-plane.
3.1.3.8
2D vertical heterostructure
two-dimensional material (3.1.1.1) consisting of two or more well-defined layers (3.1.1.8) of different 2D
materials that are stacked out-of-plane
Note 1 to entry: This is sometimes referred to as a van der Waals heterostructure.
3.1.3.9
2D in-plane heterostructure
2D lateral heterostructure
two-dimensional material (3.1.1.1) consisting of two or more well-defined layers (3.1.1.8) of different 2D
materials that are bonded to each other in the in-plane direction
3.2 Terms related to methods for producing 2D materials
3.2.1 Graphene and related 2D material production
3.2.1.1
top-down production
<2D material> process to create two-dimensional materials (3.1.1.1) from larger objects
Note 1 to entry: These processes typically involve energy in different forms in order to exfoliate the layers (3.1.1.8) apart.
Note 2 to entry: For graphene related 2D materials, graphite is the starting material.
3.2.1.2
bottom-up production
<2D material> process to create two-dimensional materials (3.1.1.1) from smaller fundamental units
Note 1 to entry: For graphene related 2D materials, many of these processes use carbon-rich gases and high
temperatures.
3.2.1.3
chemical vapour deposition
CVD
deposition of a solid material onto a substrate by chemical reaction of a gaseous precursor or mixture of
precursors, commonly initiated by heat
[SOURCE: ISO/TS 80004-8:2020, 8.2.4]
3.2.1.4
metal organic chemical vapour deposition
MOCVD
chemical vapour deposition (3.2.1.3) by chemical reaction of a precursor or mixture of precursors, including
typically one metalorganic, without the need of a catalyst substrate
Note 1 to entry: The material is typically deposited straight onto a semiconductor substrate.
3.2.1.5
plasma-enhanced chemical vapour deposition
PECVD
chemical vapour deposition (3.2.1.3) with chemical reaction rates enhanced by using plasma
Note 1 to entry: This allows deposition at lower temperatures than conventional CVD.

ISO/TS 80004-13:2024(en)
3.2.1.6
roll-to-roll production
R2R production
<2D material> CVD growth of a 2D material(s) (3.1.1.1) upon a continuous substrate that is processed as a
rolled sheet (3.1.1.4), often including transfer of a 2D material(s) to a separate substrate
3.2.1.7
mechanical exfoliation
<2D material> detachment of individual 2D material (3.1.1.1) layers (3.1.1.8) from the body of a material via
mechanical methods
Note 1 to entry: There are a number of different methods to achieve mechanical exfoliation. One method is via peeling
(also called the scotch tape method), mechanical cleavage or micromechanical exfoliation and cleavage. Another
method is via dry-media ball milling.
3.2.1.8
liquid-phase exfoliation
<2D material> exfoliation of 2D materials (3.1.1.1) from the bulk layered material in a solvent through
hydrodynamic shear-forces
Note 1 to entry: The solvent can be aqueous, organic or ionic liquid.
Note 2 to entry: A surfactant can be used in aqueous dispersions to enable or promote exfoliation and increase stability
of the dispersion.
Note 3 to entry: The shear forces can be generated by various methods including ultrasonic cavitation or high-shear mixing.
3.2.1.9
growth on silicon carbide
production of graphene layers (3.1.2.1) through controlled high temperate heating of a silicon carbide
substrate to sublimate the silicon atoms near the surface of the substrate, leaving graphene
Note 1 to entry: Graphene can be grown on the carbon-side or silicon-side of the SiC substrate with variations in the
resulting number of and stacking of graphene layers.
Note 2 to entry: The product is typically called epitaxial graphene (3.1.2.6).
3.2.1.10
graphene precipitation
production of graphene layers (3.1.2.1) on the surface of a metal, through heating and segregation of the
carbon present within the metal substrate to the surface
Note 1 to entry: Carbon impurities or dopants within the bulk of the metal can be fortuitous or deliberately introduced.
3.2.1.11
chemical synthesis
bottom-up graphene production route using small organic molecules that become linked into
carbon rings through surface-mediated reactions and elevated temperatures
3.2.1.12
alcohol precursor growth
growth of graphene (3.1.2.1) by introducing an alcohol precursor into a high temperature
environment to decompose the alcohol and form graphene
3.2.1.13
molecular beam epitaxy
MBE
process of growing single crystals in which beams of atoms or molecules are deposited on a single-crystal
substrate in vacuum, giving rise to crystals whose crystallographic orientation is in registry with that of the
substrate
Note 1 to entry: The beam is defined by allowing the vapour to escape from the evaporation zone to a high vacuum
zone through a small orifice.
ISO/TS 80004-13:2024(en)
Note 2 to entry: Structures with nanoscale features can be grown in this method by exploiting strain, e.g. InAs dots on
GaAs substrate.
[SOURCE: ISO/TS 80004-8:2020, 8.2.13]
3.2.1.14
anodic bonding
production of graphene layers (3.1.2.1) on a substrate using a graphite precursor in flake (3.1.1.3)
form, which is bonded to glass using an electrostatic field and then cleaved off
3.2.1.15
laser ablation
erosion of material from the surface of a target using energy from a pulsed laser
Note 1 to entry: Laser ablation is a method of producing nanoscale and microscale features on a surface.
[SOURCE: ISO/TS 80004-8:2020, 8.3.15, modified — Minor rewording.]
3.2.1.16
photoexfoliation
detachment of (part of) a layer (3.1.1.8) of a 2D material (3.1.1.1) due to irradiation of a laser beam
Note 1 to entry: For graphene layers (3.1.2.1), this method does not induce evaporation or sublimation of the carbon
atoms as with laser ablation (3.2.1.15).
3.2.1.17
exfoliation via chemical intercalation
<2D materials> production of single or few-layers of 2D materials (3.1.1.1) by insertion of chemical species
between the layers of a thicker layered material, followed by immersion in a liquid combined with the
application of mechanical or thermal energy
3.2.1.18
electrochemical exfoliation
production of graphene (3.1.2.1) using an ionically conductive solution (electrolyte) and a direct
current power source to prompt the structural changes and exfoliation of the graphitic precursor used as
the electrode in order to form layers (3.1.1.8) of graphene
Note 1 to entry: This method offers the potential to use environmentally benign chemicals, with elimination of harsh
oxidisers and reducers, relatively fast fabrication rates, and high mass production potential at ambient pressure and
temperature.
3.2.1.19
graphite oxidation
production of graphite oxide (3.1.2.14) from graphite (3.1.2.2) in a s
...