ASTM E684-95(2000)
(Practice)Standard Practice for Approximate Determination of Current Density of Large-Diameter Ion Beams for Sputter Depth Profiling of Solid Surfaces
Standard Practice for Approximate Determination of Current Density of Large-Diameter Ion Beams for Sputter Depth Profiling of Solid Surfaces
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1.1 This practice describes a simple and approximate method for determining the shape and current density of ion beams. The practice is limited to ion beams of diameter greater than 0.5 mm of the type used for sputtering of solid surfaces to obtain sputter depth profiles. It is assumed that the ion-beam current density is symmetrical about the beam axis.
1.2 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
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NOTICE: This standard has either been superseded and replaced by a new version or withdrawn.
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Designation: E 684 – 95 (Reapproved 2000)
Standard Practice for
Approximate Determination of Current Density of Large-
Diameter Ion Beams for Sputter Depth Profiling of Solid
Surfaces
This standard is issued under the fixed designation E 684; the number immediately following the designation indicates the year of
original adoption or, in the case of revision, the year of last revision. A number in parentheses indicates the year of last reapproval. A
superscript epsilon (e) indicates an editorial change since the last revision or reapproval.
1. Scope measuring the shape (that is, current density distribution) of the
ion beam if a suitable Faraday cup is not available.
1.1 This practice describes a simple and approximate
method for determining the shape and current density of ion
5. Procedure
beams. The practice is limited to ion beams of diameter greater
5.1 Measure the total ion current in the beam by allowing
than 0.5 mm of the type used for sputtering of solid surfaces to
the total beam to strike the carousel (or other specimen holder).
obtain sputter depth profiles. It is assumed that the ion-beam
Apply a d-c bias of about 100 V to the carousel to return
current density is symmetrical about the beam axis.
low-energy secondary electrons created by the ion beam.
1.2 This standard does not purport to address all of the
5.2 Attach a straight wire to the carousel extending over the
safety concerns, if any, associated with its use. It is the
edge such that the ion beam will strike the wire but not the
responsibility of the user of this standard to establish appro-
carousel. The wire may be tungsten or other suitable material
priate safety and health practices and determine the applica-
with a diameter of about 25 µm. The wire diameter should be
bility of regulatory limitations prior to use.
sufficient to intercept measurable ion current but small with
2. Referenced Documents respect to the ion beam diameter to minimize distortion. The
carousel may then be translated or rotated (with rotation
2.1 ASTM Standards:
converted to arc length) to determine the ion beam shape. See
E 673 Terminology Relating to Surface Analysis
Guide E 1577.
E 1127 Guide for Depth Profiling in Auger Electron Spec-
troscopy
6. Interpretation of Results
E 1577 Guide for Reporting of Ion Beam Parameters Used
2 6.1 In general, a Gaussian current distribution will be
in Surface Analysis
observed and the full width at half-maximum peak height can
3. Terminology be determined. The maximum ion beam current density may
then be determined as follows:
3.1 Terms used in Auger electron spectroscopy are defined
in Terminology E 673.
i
J 5 0.88 (1)
max
FWHM
~ !
4. Significance and Use
where:
4.1 Sputter depth profiling is used in conjunction with
J = maximum ion beam current density,
Auger electron spectroscopy, x-ray photoelectron spectros-
max
+
i = otal ion current, and
copy, and secondary ion mass spectrometry to determine the
FWHM = full width at half-maximum pe
...
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5.1.1 The user is encouraged to verify the theoretical stage-discharge relation with direct current-meter measurements when possible.
5.1.2 To develop a rating curve, plot stage versus discharge for several discharges and their computed stages on a rating curve together with direct current-meter measurements.
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